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粉末与颗粒镀膜原子层沉积系统

基本信息
产品名称:
粉末与颗粒镀膜原子层沉积系统
英文名称:
ALD for powder and particles
国产/进口:
进口
产地/品牌:
美国/Nanosolutions
型号:
FP ALD
参考报价:
总点击数:
1735
更新日期:
2024-11-27
产品类别:

性能参数

粉末与颗粒原子层沉积系统 ALD

美国ALD NANOSOLUTIONS公司技术,专注于粉末颗粒表面镀膜。

 

专用于在粉末、颗粒表面沉积ALD薄膜,可用于科研,生产。单批次体积从45ml~150L,满足科研到生产的需要。可沉积氧化物,氮化物,金属等类型薄膜。可用于锂离子电池、催化剂等需要粉末镀膜的行业。

专业的粉末镀膜原子层沉积系统,为科研与生产提供专业的解决方案。

 

设备沉积方法有:流化床法、滚动法、振动法。

 

粉末原子层沉积系统型号:

FX系列:75 or 150 mL,适用于R&D

FP系列:  500 mL / 2 L / 5 L / 10 L,适用于R&D,生产

RX系列10 or 40 mL, 适用于R&D 

RP系列: ~40L, 适用于生产

CVR系列:15L/hr to 150L/hr,适用于生产

 

 

fxALDN FP ReactorALDN RX with Glove Box Option

 

粉末原子层沉积系统技术参数:

 

 

ALD REACTOR SYSTEMS

Fluidized
    Bed Reactors
    (FBR)

Rotary Reactors (Rotary)

Continuous Vibrating Reactors (CVR)

Substrate Volume

75mL to 10L per batch

10ml to 40L

15L/hr to 150L/hr

Substrate Mass
    (Density Dependent)

75g - 12.5kg per batch

10g - 50kg per batch

15kg/hr to 150kg/hr

Vapor Draw Sources

2 standard,
    up to 8

2 standard,
    up to 8

2 standard,
    up to 8

Regulatory Compliance

CE, GMP and ISO compliance upon request

Weight

300 lbs -
    1,000 lbs (150kg - 500kg)

300lbs - 4,000lb (150kg
    - 2000kg)

500lbs - 8,000lb (250kg - 4000kg)

Venting  Emissions and   Abatement

Equipment can be designed to comply with local jurisdiction   codes and regulations

Electrical Requirements

Project-specific and customized. Further details can be   supplied upon request

Demonstrated Particle Diameters

10 nm - 500micron

10 nm - 200micron

5-50micron

Potential  Particle   Diameters

2 nm - 1mm

2 nm - 250px

10nm - 1 cm

Other Features

Highest Precursor Efficiency

Plasma ALD Compatible

Atmospheric Pressure Operation

 

 

Fluidization Reactor – Experimental Series (FX)

Reactor Style:

Fluidization Reactor

Substrate Volume:

75 or 150 mL

Reactor Temperatures Range:

25 – 450 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 4

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

300 lbs/ 140 kg

Options Available:

Substrate Loading

Low Vapor Pressure Containers capable of   150 °C

Residual Gas Analyzer

Waste Abatement

Glovebox

Research License for ALD on Particles

Various Vapor Sources

 

Fluidization Reactor – Pilot Series (FP)

Reactor Style:

Fluidization Reactor

Substrate Volume:

500 mL / 2 L / 5 L / 10 L

Reactor Temperatures Range:

25 – 450 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

400 lbs/ 180 kg

Options Available:

Substrate Loading

 

Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Research License for ALD on Particles

Various Vapor Sources

Rotary ALD Reactor – Pilot Series (RP)

Reactor Style:

Rotary Reactor

Substrate Volume:

~40 L

Reactor Temperatures Range:

25 – 200 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

500 lbs/ 230 kg

Options Available:

Substrate Loading

 

Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Integrated Glovebox

Research License for ALD on Particles

Various Vapor Sources

 

Rotary ALD Reactor – Experimental Series (RX)

 

Reactor Style:

Rotary Reactor

Substrate Volume:

10 or 40 mL

Reactor Temperatures Range:

25 – 200 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

300 lbs/ 140 kg

Options Available:

Substrate Loading

 

Plasma Source from Meaglow

Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Integrated Glovebox

Research License for ALD on Particles

Various Vapor Sources

 
公司简介
北京伯英科技有限公司致力于引进世界先进的技术与仪器设备,为中国用户的科研服务。
世有伯乐,而后有千里马。公司致力于成为我们的用户所需要的千里马,为用户提供世界先进的科研仪器设备与技术服务;公司致力于成为伯乐,致力于挖掘世界先进的技术与科研仪器设备,为用户的科研服务;公司致力于成为伯乐,致力于给我们的员工提供卓越的发展平台,共同发展进步。
我们的产品可用于生命科学(分子相互作用),胶体与化学表界面,薄膜沉积与表征,微电子与半导体行业,航空航天器件可靠性检测,以及其他集成电路与器件可靠性检测与失效分析,混凝土行业,无损超声探伤检测,超声医学成像等方面。
伯英科技,志行千里!

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010 56237312

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