粉末与颗粒镀膜原子层沉积系统
粉末与颗粒原子层沉积系统 ALD
美国ALD NANOSOLUTIONS公司技术,专注于粉末颗粒表面镀膜。
专用于在粉末、颗粒表面沉积ALD薄膜,可用于科研,生产。单批次体积从45ml~150L,满足科研到生产的需要。可沉积氧化物,氮化物,金属等类型薄膜。可用于锂离子电池、催化剂等需要粉末镀膜的行业。
专业的粉末镀膜原子层沉积系统,为科研与生产提供专业的解决方案。
设备沉积方法有:流化床法、滚动法、振动法。
粉末原子层沉积系统型号:
FX系列:75 or 150 mL,适用于R&D
FP系列: 500 mL / 2 L / 5 L / 10 L,适用于R&D,生产
RX系列:10 or 40 mL, 适用于R&D
RP系列: ~40L, 适用于生产
CVR系列:15L/hr to 150L/hr,适用于生产



粉末原子层沉积系统技术参数:
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ALD REACTOR SYSTEMS |
Fluidized |
Rotary Reactors (Rotary) |
Continuous Vibrating Reactors (CVR) |
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Substrate Volume |
75mL to 10L per batch |
10ml to 40L |
15L/hr to 150L/hr |
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Substrate Mass |
75g - 12.5kg per batch |
10g - 50kg per batch |
15kg/hr to 150kg/hr |
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Vapor Draw Sources |
2 standard, |
2 standard, |
2 standard, |
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Regulatory Compliance |
CE, GMP and ISO compliance upon request |
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Weight |
300 lbs - |
300lbs - 4,000lb (150kg |
500lbs - 8,000lb (250kg - 4000kg) |
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Venting Emissions and Abatement |
Equipment can be designed to comply with local jurisdiction codes and regulations |
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Electrical Requirements |
Project-specific and customized. Further details can be supplied upon request |
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Demonstrated Particle Diameters |
10 nm - 500micron |
10 nm - 200micron |
5-50micron |
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Potential Particle Diameters |
2 nm - 1mm |
2 nm - 250px |
10nm - 1 cm |
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Other Features |
Highest Precursor Efficiency |
Plasma ALD Compatible |
Atmospheric Pressure Operation |
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Fluidization Reactor – Experimental Series (FX)
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Reactor Style: |
Fluidization Reactor |
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Substrate Volume: |
75 or 150 mL |
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Reactor Temperatures Range: |
25 – 450 °C |
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Maximum Process Line Temperatures: |
200 °C |
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Vapor Draw Sources: |
2 standard, up to 4 |
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Dosing Valves: |
Heated Metal Diaphragm |
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Vacuum Pump: |
Rotary Vane (9 CFM or greater) |
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Regulatory Compliance: |
CE Marked |
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Weight: |
300 lbs/ 140 kg |
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Options Available: |
Substrate Loading Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Glovebox Research License for ALD on Particles Various Vapor Sources |
Fluidization Reactor – Pilot Series (FP)
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Reactor Style: |
Fluidization Reactor |
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Substrate Volume: |
500 mL / 2 L / 5 L / 10 L |
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Reactor Temperatures Range: |
25 – 450 °C |
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Maximum Process Line Temperatures: |
200 °C |
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Vapor Draw Sources: |
2 standard, up to 8 |
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Dosing Valves: |
Heated Metal Diaphragm |
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Vacuum Pump: |
Rotary Vane (9 CFM or greater) |
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Regulatory Compliance: |
CE Marked |
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Weight: |
400 lbs/ 180 kg |
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Options Available: |
Substrate Loading
Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Research License for ALD on Particles Various Vapor Sources |
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Reactor Style: |
Rotary Reactor |
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Substrate Volume: |
~40 L |
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Reactor Temperatures Range: |
25 – 200 °C |
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Maximum Process Line Temperatures: |
200 °C |
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Vapor Draw Sources: |
2 standard, up to 8 |
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Dosing Valves: |
Heated Metal Diaphragm |
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Vacuum Pump: |
Rotary Vane (9 CFM or greater) |
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Regulatory Compliance: |
CE Marked |
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Weight: |
500 lbs/ 230 kg |
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Options Available: |
Substrate Loading
Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Integrated Glovebox Research License for ALD on Particles Various Vapor Sources |
Rotary ALD Reactor – Experimental Series (RX)
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Reactor Style: |
Rotary Reactor |
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Substrate Volume: |
10 or 40 mL |
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Reactor Temperatures Range: |
25 – 200 °C |
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Maximum Process Line Temperatures: |
200 °C |
|
Vapor Draw Sources: |
2 standard, up to 8 |
|
Dosing Valves: |
Heated Metal Diaphragm |
|
Vacuum Pump: |
Rotary Vane (9 CFM or greater) |
|
Regulatory Compliance: |
CE Marked |
|
Weight: |
300 lbs/ 140 kg |
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Options Available: |
Substrate Loading
Plasma Source from Meaglow Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Integrated Glovebox Research License for ALD on Particles Various Vapor Sources |